Code: MTA7826 | Publication Date: Aug 2025 |
The market is expanding due to rising demand for advanced semiconductor manufacturing, increasing adoption of extreme ultraviolet (EUV) lithography, and growing investments in chip fabrication facilities worldwide.
Lithography equipment market is witnessing trends like rapid adoption of EUV systems for sub-7nm chip production, increased demand for deep ultraviolet (DUV) immersion systems in mature nodes, and the use of computational lithography and AI for process optimization. EUV lithography Fundamentally concerned with extending the capabilities of EUV to newer limits is a burgeoning interest in high-numerical-aperture (High-NA) systems. Hybrid strategies of blending several lithography processes are also being developed by manufacturers to increase throughput and yield.
Lithography equipment market is experiencing developments such as the launch of next-generation High-NA EUV systems, strategic collaborations between toolmakers and chip manufacturers for co-development, and the integration of advanced metrology and inspection tools to improve pattern fidelity. The trend of supply chain diversification and production of crucial items locally is picking up to limit the amount of geopolitical risk. Lithography R&D investments are also getting heated up to meet challenges at the scaling below 2nm technology nodes.
Below is a comprehensive list of the leading market players driving growth in this sector:
Company Name | ASML Holding N.V. |
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Established Year | 1984 |
Headquarters | Veldhoven, Netherlands |
Official Website | Click Here |
ASML is the global leader in photolithography equipment, specializing in advanced EUV and DUV systems essential for high-performance semiconductor manufacturing processes.
Company Name | Nikon Corporation |
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Established Year | 1917 |
Headquarters | Tokyo, Japan |
Official Website | Click Here |
Nikon produces high-precision lithography steppers and scanners for semiconductor fabrication, focusing on optical performance, accuracy, and advanced node capabilities.
Company Name | Canon Inc. |
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Established Year | 1937 |
Headquarters | Tokyo, Japan |
Official Website | Click Here |
Canon offers photolithography equipment for semiconductor and display production, known for innovative optics and cost-effective manufacturing solutions.
Company Name | Veeco Instruments Inc. |
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Established Year | 1945 |
Headquarters | New York, USA |
Official Website | Click Here |
Veeco develops lithography and patterning systems for advanced packaging, MEMS, and compound semiconductor applications, emphasizing process efficiency and yield improvement.
Company Name | SÃSS MicroTec SE |
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Established Year | 1949 |
Headquarters | Garching, Germany |
Official Website | Click Here |
SÃSS MicroTec designs mask aligners and coat/bake/develop systems for MEMS, LED, and packaging markets, focusing on high precision and process flexibility.
Company Name | EV Group (EVG) |
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Established Year | 1980 |
Headquarters | St. Florian am Inn, Austria |
Official Website | Click Here |
EV Group provides lithography and nanoimprint equipment for MEMS, photonics, and advanced packaging, enabling high-volume manufacturing with superior alignment accuracy.
Company Name | Ultratech (A Subsidiary of Veeco) |
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Established Year | 1979 |
Headquarters | California, USA |
Official Website | Click Here |
Ultratech manufactures advanced packaging lithography systems, delivering cost-effective solutions for flip-chip, wafer-level packaging, and LED applications.
Company Name | SMEE (Shanghai Micro Electronics Equipment Co., Ltd.) |
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Established Year | 2002 |
Headquarters | Shanghai, China |
Official Website | Click Here |
SMEE develops lithography systems for integrated circuits, flat-panel displays, and packaging, aiming to strengthen Chinaâs domestic semiconductor manufacturing capabilities.
Company Name | JEOL Ltd. |
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Established Year | 1949 |
Headquarters | Tokyo, Japan |
Official Website | Click Here |
JEOL produces electron beam lithography systems with ultra-fine resolution, catering to research institutions, nanotechnology, and semiconductor R&D applications.
Company Name | Raith GmbH |
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Established Year | 1980 |
Headquarters | Dortmund, Germany |
Official Website | Click Here |
Raith specializes in electron beam and nanoimprint lithography tools for nanofabrication, used in research, prototyping, and small-scale semiconductor production.