Code: MTA7827 | Publication Date: Aug 2025 |
The market is expanding due to the rising demand for advanced chip manufacturing, growth in printed electronics, and increasing adoption of EUV lithography technologies.
Lithography market is witnessing trends such as rapid of EUV lithography for advanced nodes, increased deployment of DUV immersion systems for mature processes, and the use of nanoimprint lithography in niche applications. High-NA EUV is pushed to extend Moore and to enhance resolution. Computation lithography and AI-negotiated process optimization are aiding chip makers to maximize chip yield without stretching budget.
Lithography market is experiencing developments like the commercialization of High-NA EUV tools, strategic partnerships between lithography equipment suppliers and semiconductor foundries, and innovations in photoresist materials to enable smaller nodes. Diversification of the supply chain and regionalization of production of lithography tools are undertaken to counter geopolitical risk. Complex chip designs are also becoming an area of new interest in hybrid lithography techniques.
Below is a comprehensive list of the leading market players driving growth in this sector:
Company Name | ASML Holding N.V. |
---|---|
Established Year | 1984 |
Headquarters | Veldhoven, Netherlands |
Official Website | Click Here |
ASML is the global leader in advanced lithography systems, including EUV and DUV technologies, enabling next-generation semiconductor manufacturing with high precision.
Company Name | Nikon Corporation |
---|---|
Established Year | 1917 |
Headquarters | Tokyo, Japan |
Official Website | Click Here |
Nikon provides optical lithography steppers and scanners for semiconductor manufacturing, focusing on advanced node processing and high-resolution patterning.
Company Name | Canon Inc. |
---|---|
Established Year | 1937 |
Headquarters | Tokyo, Japan |
Official Website | Click Here |
Canon manufactures photolithography and nanoimprint equipment for semiconductor, flat-panel display, and storage device production, emphasizing innovation and reliability.
Company Name | Veeco Instruments Inc. |
---|---|
Established Year | 1945 |
Headquarters | New York, USA |
Official Website | Click Here |
Veeco delivers lithography and patterning solutions for advanced packaging, MEMS, and compound semiconductors, optimizing efficiency and production yield.
Company Name | SÜSS MicroTec SE |
---|---|
Established Year | 1949 |
Headquarters | Garching, Germany |
Official Website | Click Here |
SÜSS MicroTec develops mask aligners and coat/develop systems for MEMS, LEDs, and packaging markets, with an emphasis on flexibility and precision.
Company Name | EV Group (EVG) |
---|---|
Established Year | 1980 |
Headquarters | St. Florian am Inn, Austria |
Official Website | Click Here |
EVG provides lithography and nanoimprint tools for MEMS, photonics, and advanced packaging, supporting high-volume production with superior alignment accuracy.
Company Name | SMEE (Shanghai Micro Electronics Equipment Co., Ltd.) |
---|---|
Established Year | 2002 |
Headquarters | Shanghai, China |
Official Website | Click Here |
SMEE produces lithography systems for integrated circuits, packaging, and display applications, aiming to advance China’s domestic semiconductor industry.
Company Name | JEOL Ltd. |
---|---|
Established Year | 1949 |
Headquarters | Tokyo, Japan |
Official Website | Click Here |
JEOL specializes in electron beam lithography systems offering ultra-fine resolution for semiconductor R&D, nanotechnology, and prototyping applications.
Company Name | Raith GmbH |
---|---|
Established Year | 1980 |
Headquarters | Dortmund, Germany |
Official Website | Click Here |
Raith provides electron beam and nanoimprint lithography solutions for nanofabrication, catering to research institutions and small-scale semiconductor manufacturing.
Company Name | Onto Innovation Inc. |
---|---|
Established Year | 2019 |
Headquarters | Massachusetts, USA |
Official Website | Click Here |
Onto Innovation offers advanced process control and lithography equipment, integrating metrology and inspection to enhance semiconductor yield and performance.